Innovating Works

AMTC

Desconocido
ID2PPAC: Integration of processes and moDules for the 2 nm node meeting Power Performance Area and Cost requi... ADVANCED MASK TECHNOLOGY CENTER GMBH CO KG participó en un H2020: H2020-ECSEL-2020-1-IA-two-stage In the ID2PPAC project the technology solutions for the 2nm node identified in the preceding project IT2 will be consolidated and integrated...
2021-05-12 - 2024-12-31 | Financiado
TAPES3: Technology Advances for Pilotline of Enhanced Semiconductors for 3nm ADVANCED MASK TECHNOLOGY CENTER GMBH CO KG participó en un H2020: H2020-ECSEL-2017-1-IA-two-stage "In line with industry needs, Moore’s law, scaling in ITRS 2013, and ECSEL JU MASP 2017, the main objective of the TAPES3 project is to disc...
2018-05-17 - 2022-01-31 | Financiado
SeNaTe: Seven Nanometer Technology ADVANCED MASK TECHNOLOGY CENTER GMBH CO KG participó en un H2020: ECSEL-2014-2 The SeNaTe project is the next in a chain of thematically connected ENIAC JU KET pilot line projects which are associated with 450mm/300mm d...
2015-08-27 - 2018-03-31 | Financiado
E450LMDAP: European 450mm Lithography and Metrology Development for Advanced Patterning ADVANCED MASK TECHNOLOGY CENTER GMBH CO KG participó en un FP7: The overall goal of the E450LMDAP project is to develop 450 mm lithography and metrology modules and tools and to initiate distributed pilot...
Financiado
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