Innovating Works

AMTC

Desconocido
ID2PPAC: Integration of processes and moDules for the 2 nm node meeting Power Performance Area and Cost requi... ADVANCED MASK TECHNOLOGY CENTER GMBH CO KG participó en un H2020 H2020-ECSEL-2020-1-IA-two-stage In the ID2PPAC project the technology solutions for the 2nm node identified in the preceding project IT2 will be consolidated and integrated...
2021-05-12 - 2024-12-31 | Financiado
TAPES3: Technology Advances for Pilotline of Enhanced Semiconductors for 3nm ADVANCED MASK TECHNOLOGY CENTER GMBH CO KG participó en un H2020 H2020-ECSEL-2017-1-IA-two-stage "In line with industry needs, Moore’s law, scaling in ITRS 2013, and ECSEL JU MASP 2017, the main objective of the TAPES3 project is to disc...
2018-05-17 - 2022-01-31 | Financiado
SeNaTe: Seven Nanometer Technology ADVANCED MASK TECHNOLOGY CENTER GMBH CO KG participó en un H2020 ECSEL-2014-2 The SeNaTe project is the next in a chain of thematically connected ENIAC JU KET pilot line projects which are associated with 450mm/300mm d...
2015-08-27 - 2018-03-31 | Financiado
E450LMDAP: European 450mm Lithography and Metrology Development for Advanced Patterning ADVANCED MASK TECHNOLOGY CENTER GMBH CO KG participó en un FP7 The overall goal of the E450LMDAP project is to develop 450 mm lithography and metrology modules and tools and to initiate distributed pilot...
Financiado
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