Scalable, ferroelectric based accelerators for energy efficient edge AI
The Ferro4EdgeAI project will provide an ultra-low power, scalable edge accelerator for artificial intelligence incorporating a memory augmented neural network, based on low cost, high density, multi-level, Back End of Line (BEoL)...
The Ferro4EdgeAI project will provide an ultra-low power, scalable edge accelerator for artificial intelligence incorporating a memory augmented neural network, based on low cost, high density, multi-level, Back End of Line (BEoL) integrated ferroelectric (FE) technology.
We expect to achieve a 2500x gain in energy-efficiency to break the POPS/W barrier with respect to the state-of-the-art CMOS accelerators and predictions for other emerging technology AI hardware. To do so, five ambitious specific objectives have been selected:
- multi-level functionality in hafnia-based thin films by investigating the optimum trade-off in memory window, film thickness & stability of the ferroelectric state
- low operating voltage for the non-volatile memory and robust multilevel operation of the FeFET-2 for high density logic operations and data storage. A low operating voltage is mandatory for power rating reduction, while robust multilevel operation is essential for analogue in-memory computing at the edge.
- integration and characterization of multi-level, low voltage, FeFET-2 arrays
- definition, design and demonstration of a low power FE AI accelerator suitable for scalable systems integration
- Systems simulation of ultra-low power FE accelerator enhanced edge processing for targeted edge applications of voice and image recognition
Ferro4EdgeAI is a multidisciplinary project engaging 12 partners from 6 countries covering the academic and industrial worlds (including 2 SMEs). An implementation plan is presented in the form of 6 work packages, 5 of which are technical in nature. Synergy in communication and dissemination by the several partners and stakeholders (including an external advisory board and collaboration with South Korea) will maximize the project progress and impact. Solutions to overcome the fundamental technological barriers as well as appropriate deliverables, tasks, milestones, and risks to complete the project objectives in due time are presented.ver más
Seleccionando "Aceptar todas las cookies" acepta el uso de cookies para ayudarnos a brindarle una mejor experiencia de usuario y para analizar el uso del sitio web. Al hacer clic en "Ajustar tus preferencias" puede elegir qué cookies permitir. Solo las cookies esenciales son necesarias para el correcto funcionamiento de nuestro sitio web y no se pueden rechazar.
Cookie settings
Nuestro sitio web almacena cuatro tipos de cookies. En cualquier momento puede elegir qué cookies acepta y cuáles rechaza. Puede obtener más información sobre qué son las cookies y qué tipos de cookies almacenamos en nuestra Política de cookies.
Son necesarias por razones técnicas. Sin ellas, este sitio web podría no funcionar correctamente.
Son necesarias para una funcionalidad específica en el sitio web. Sin ellos, algunas características pueden estar deshabilitadas.
Nos permite analizar el uso del sitio web y mejorar la experiencia del visitante.
Nos permite personalizar su experiencia y enviarle contenido y ofertas relevantes, en este sitio web y en otros sitios web.