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Plasmon Enhanced Photocatalytic Nano Lithography
The emergence of nanoscience and nanotechnology, with envisioned applications spanning from nano-optics and nano-photonics, to plasmonics and nano-electronics, depends on the capability to fabricate a variety of nanometre-scale st...
The emergence of nanoscience and nanotechnology, with envisioned applications spanning from nano-optics and nano-photonics, to plasmonics and nano-electronics, depends on the capability to fabricate a variety of nanometre-scale structures. Despite the impressive development in these fields, breakthroughs remain in the laboratory, largely due to technological limitations in the ability to manufacture complex and accurate nanometer-resolved surface patterns, with satisfying resolution and on large area. The development of a new fabrication methodology is thus required. We propose to develop and demonstrate a novel technique for nanoscale photolithography that would bring 21st century nanotechnology breakthroughs out of the lab and into the public sphere. This technique is based on a chemical mechanism recently discovered in my lab. We revealed that multi-electron photocatalytic reactions could be directed to progress exclusively under a plasmonic field, in a controlled and highly localized manner. In this proposal we describe how this phenomenon may be leveraged for pattering, and high-resolution nano lithography. The project is divided into 3 stages: 1. Fundamentals of the underlying physical phenomena 2. Probe enhanced photocatalytic writing 3. Photolithography via plasmon enhanced photocatalytic mask At the end of the 5-year project we expect to be at a position to demonstrate our platform for lithographic writing of an interesting nano pattern of high quality, and establish the potential of this methodology as a powerful instrument in the nanotechnology researcher’s toolbox. I strongly believe that successful implementation of this project would fundamentally change the way in which nanotechnology affects modern life.
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Duración del proyecto: 81 meses
Fecha Inicio: 2019-09-26
Fecha Fin: 2026-06-30
Fecha Fin: 2026-06-30
Línea de financiación: concedida
El organismo H2020 notifico la concesión del proyecto el día 2019-09-26
Línea de financiación objetivo
El proyecto se financió a través de la siguiente ayuda:
ERC-2019-STG:
ERC Starting Grant
Cerrada
hace 6 años
Presupuesto
El presupuesto total del proyecto asciende a
2M€
Líder del proyecto
TECHNION ISRAEL INSTITUTE OF TECHNOLOGY
No se ha especificado una descripción o un objeto social para esta compañía.
Perfil tecnológico
TRL
4-5
Perfil tecnológico
TRL
4-5
10.44M€ |
Participante