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Photonics on Germanium - New Industrial Consortium

The project scope is to develop an innovative technology of germanium (Ge)-based VCSEL. The main objective is to develop a Ge-VCSEL epi-growth by MOCVD and MBE techniques and processing of high performance and reliable lasers to b... ver más

30/09/2025

TECHNIKON

5M€

Presupuesto del proyecto: 5M€

Líder del proyecto

TECHNIKON FORSCHUNGS UND PLANUNGSGESELLSCHAFT... No se ha especificado una descripción o un objeto social para esta compañía.

TRL 4-5

Fecha límite participación Sin fecha límite de participación.

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Financiación concedida El organismo HORIZON EUROPE notifico la concesión del proyecto el día 2022-06-23

HORIZON-CL4-2021-DIGITAL-EMERGING-01-12: European Network of Excellence Cent... Expected Outcome:Proposal results are expected to contribute to all the following expected outcomes:

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Este proyecto no cuenta con búsquedas de partenariado abiertas en este momento.

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No hay información privada compartida para este proyecto. Habla con el coordinador.

8 Participantes

TECHNIKON

370.00K€ | Lider

SIEC BADAWCZA LUKASIEWICZ I...

300.00K€ | Participante

XENOMATIX

424.06K€ | Participante

PMDINDUSTRIAL GMBH

775.00K€ | Participante

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Duración del proyecto: 39 meses Fecha Inicio: 2022-06-23
Fecha Fin: 2025-09-30

Líder del proyecto

TECHNIKON FORSCHUNGS UND PLANUNGSGESELLSCHAFT... No se ha especificado una descripción o un objeto social para esta compañía.

TRL 4-5

Presupuesto del proyecto 5M€

Fecha límite de participación Sin fecha límite de participación.

Descripción del proyecto The project scope is to develop an innovative technology of germanium (Ge)-based VCSEL. The main objective is to develop a Ge-VCSEL epi-growth by MOCVD and MBE techniques and processing of high performance and reliable lasers to be integrated in 3D camera and LiDAR demonstrators. The key challenge is to achieve high crystal quality of grown layers while taking the advantage of a better crystallographic lattice sameness between Ge and Al gallium arsenide (GaAs), which enables to decrease misfit defects density and in consequence to increase the quantum efficiency of the device. Several characterisation methods will be used as X-ray diffraction and topography, depth high resolution SIMS, electron microscopy (SEM/TEM), atomic force microscopy, reflectance, PL mapping, and others. Each growing campaign will be concluded by processing of conventional VCSELs (GaAs-based) and VCSELs on Ge which will allow the verification of VCSELs parameters and comparison of both type devices. The VCSEL technology drives a dynamic market with constant need for innovative solutions. Demonstration of high performing devices of Ge-on-Si can unlock potentially large markets from optical data communications to imaging, lighting and displays, to the manufacturing sector, to life sciences, health care, security and safety. In commercial applications, the performance, costs and the strong reduction of toxic elements will be very important factors to drive a replacement of the current technology. The Ge, offering a higher yield and less production losses due to higher uniformity at larger size wafer, is promised to lower the environmental burden compared to expensive GaAs substrate. As the VCSEL sector is developing dynamically with laser production expected to triple in the next five years, the project, with its innovative Ge-VCSEL solution, has the potential to significantly contribute to the reduction of lasers’ global usage of toxic materials, and improve the device performances.

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