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MADEin4

Financiado

Metrology Advances for Digitized ECS industry 4.0

The metrology domain (which could be considered as the ‘eyes and ears’ for both R&D&I and production) is a key enabler for productivity enhancements in many industries across the electronic components and system (ECS) value chain... ver más

30/09/2022

AMIL

127M€

Presupuesto del proyecto: 127M€

Líder del proyecto

APPLIED MATERIALS ISRAEL LTD No se ha especificado una descripción o un objeto social para esta compañía.

TRL 4-5

Ver 50 Participantes

Financiación concedida El organismo H2020 notifico la concesión del proyecto el día 2022-09-30

Línea de financiación objetivo El proyecto se financió a través de la siguiente ayuda:

ECSEL-2018-1-IA: ECSEL-2018-1-IA

I+D

Cerrada hace 6 años

0% 100%

50 Participantes

AMIL

2.61M€ | Lider

CONFIRMSIGN, SL

493.56K€ | Participante

SIEMENS ELECTRONIC DESIGN AU...

29.13K€ | Participante

TU Delft

531.18K€ | Participante

Últimas noticias

29-11-2024: IDAE En las últimas 48 horas el Organismo IDAE ha otorgado 4 concesiones

29-11-2024: ECE En las últimas 48 horas el Organismo ECE ha otorgado 2 concesiones

29-11-2024: CMVAMADRID En las últimas 48 horas el Organismo CMVAMADRID ha otorgado 37 concesiones

Duración del proyecto: 40 meses Fecha Inicio: 2019-05-21
Fecha Fin: 2022-09-30

Líder del proyecto

APPLIED MATERIALS ISRAEL LTD

TRL 4-5

Presupuesto del proyecto 127M€

Descripción del proyecto The metrology domain (which could be considered as the ‘eyes and ears’ for both R&D&I and production) is a key enabler for productivity enhancements in many industries across the electronic components and system (ECS) value chain and have to be an integral part of any Cyber Physical Systems (CPS) which consist of metrology equipment, virtual metrology or Industrial internet of things (IIoT) sensors, edge and high-performance computing (HPC). The requirements from the metrology is to support ALL process steps toward the final product. However, for any given ECS technology, there is a significant trade-off between the metrology sensitivity, precision and accuracy to its productivity. MADEin4 address this deficiency by focusing on two productivity boosters which are independent from the sensitivity, precision and accuracy requirements: • Productivity booster 1: High throughput, next generation metrology and inspection tools development for the nanoelectronics industry (all nodes down to 5nm). This booster will be developed by the metrology equipment’s manufacturers and demonstrated in an industry 4.0 pilot line at imec and address the ECS equipment, materials and manufacturing major challenges (MASP Chapter 15, major challenges 1 – 3). • Productivity booster 2: CPS development which combines Machine Learning (ML) of design (EDA) and metrology data for predictive diagnostics of the process and tools performances predictive diagnostics of the process and tools performances (predictive yield and tools performance). This booster will be developed and demonstrated in an industry 4.0 pilot line at imec, for the 5nm node, by the EDA, computing and metrology partners (MASP Chapter 15, major challenge 4). The same CPS concept will be demonstrated for the ‘digital industries’ two major challenges of the nanoelectronics (all nodes down to 5nm) and automotive end user’s partners (MASP Chapter 9, major challenges 1and 3).

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