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FabouLACE

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Dispersion force masked-based helium atom lithography

As Margrethe Vestager, European Commission Executive Vice-President, said There is no ‘digital’ without chips. Leading-edge semiconductors provide the foundation of the digitalization of entire sectors and industries that are tra... ver más

30/11/2026

HVL

2M€

Presupuesto del proyecto: 2M€

Líder del proyecto

HOGSKULEN PA VESTLANDET No se ha especificado una descripción o un objeto social para esta compañía.

Fecha límite participación Sin fecha límite de participación.

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Financiación concedida El organismo HORIZON EUROPE notifico la concesión del proyecto el día 2023-10-31

HORIZON-EIC-2023-TRANSITIONOPEN-01: EIC Transition Open 2023 Scope:EIC Transition funds innovation activities that go beyond the experimental proof of principle...

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Este proyecto no cuenta con búsquedas de partenariado abiertas en este momento.

Información adicional privada

No hay información privada compartida para este proyecto. Habla con el coordinador.

2 Participantes

HVL

2.15M€ | Lider

IMEC

345.71K€ | Participante

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Duración del proyecto: 36 meses Fecha Inicio: 2023-10-31
Fecha Fin: 2026-11-30

Líder del proyecto

HOGSKULEN PA VESTLANDET No se ha especificado una descripción o un objeto social para esta compañía.

Presupuesto del proyecto 2M€

Fecha límite de participación Sin fecha límite de participación.

Descripción del proyecto As Margrethe Vestager, European Commission Executive Vice-President, said There is no ‘digital’ without chips. Leading-edge semiconductors provide the foundation of the digitalization of entire sectors and industries that are transforming the EU economy and of emerging technologies such as artificial intelligence and quantum computing. Photolithography is currently used for the initial patterning step of chip manufacturing and leading-edge chips require smaller and smaller features. The smallest features that can be produced with this technology (26 nm at present and expected to reach 16 nm in 2028) not only limits the performance and power efficiency of leading-edge chips, but also the opening of new markets linked to quantum devices and silicon devices with integrated light sources. FabouLACE project catches this opportunity through a disruptive lithography approach that uses metastable atoms and dispersion force-based masks and enables features of 2 nm. The technology, currently at proof of concept stage and protected by two patents, will be brought at TRL 6 by the end of the project by developing a prototype. Its performances will be validated together with Imec (key actor in the development, testing and early adoption of nano- and digital technology innovations, including lithography) and end-users in the markets of interest. The spin-off Lace, founded in 2022, will bring the technology to the market by 2031. The technology has already attracted a great interest among investors (450k€ raised in few months) and among the major foundry Intel that accepted Lace in its highly competitive start-up program intel-ignite. Market and business readiness will be developed together with end-users and leveraging on the economic support from investors (>3M€ private funding expected to be attracted by 2026). The technological and business maturation is expected to result in as much as 628M€ in revenue in the 2031-2036 period. Let the quantum future begin.

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